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Dry etching of TiSi2.
- Source :
- Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1986, Vol. 4 Issue 3, p739-743, 5p
- Publication Year :
- 1986
Details
- Language :
- English
- ISSN :
- 07342101
- Volume :
- 4
- Issue :
- 3
- Database :
- Complementary Index
- Journal :
- Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films
- Publication Type :
- Academic Journal
- Accession number :
- 74328042
- Full Text :
- https://doi.org/10.1116/1.573822