Dry etching of TiSi2.

Authors :: Cadien, K. C.
Sivaram, S.
Reintsema, C. D.
Source :: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1986, Vol. 4 Issue 3, p739-743, 5p
Publication Year :: 1986

Language :: English
ISSN :: 07342101
Volume :: 4
Issue :: 3
Database :: Complementary Index
Journal :: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films
Publication Type :: Academic Journal
Accession number :: 74328042
Full Text :: https://doi.org/10.1116/1.573822