Surface hydrogen content and passivation of silicon deposited by plasma induced chemical vapor deposition from silane and the implications for the reaction mechanism.

Details

Language :

English

ISSN :

07342101

Volume :

7

Issue :

4

Database :

Complementary Index

Journal :

Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films

Publication Type :

Academic Journal

Accession number :

74329888

Full Text :

https://doi.org/10.1116/1.575806