Thermal stability and hydrogen atom induced etching of nanometer-thick a-Si:H films grown by ion-beam deposition on Si(100) surfaces.

Details

Language :

English

ISSN :

07342101

Volume :

21

Issue :

4

Database :

Complementary Index

Journal :

Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films

Publication Type :

Academic Journal

Accession number :

74337340

Full Text :

https://doi.org/10.1116/1.1575213