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Use of polymethylmethacrylate as an initial pattern transfer layer in fluorine- and chlorine-based reactive-ion etching.
- Source :
- Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1999, Vol. 17 Issue 1, p113-117, 5p
- Publication Year :
- 1999
Details
- Language :
- English
- ISSN :
- 10711023
- Volume :
- 17
- Issue :
- 1
- Database :
- Complementary Index
- Journal :
- Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures
- Publication Type :
- Academic Journal
- Accession number :
- 74343504
- Full Text :
- https://doi.org/10.1116/1.590524