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X-ray measurements of stress in thin single-crystal silicon films.

Authors :
Kamins, T. I.
Meieran, E. S.
Source :
Journal of Applied Physics; Nov1973, Vol. 44 Issue 11, p5064-5066, 3p
Publication Year :
1973

Details

Language :
English
ISSN :
00218979
Volume :
44
Issue :
11
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
75070737
Full Text :
https://doi.org/10.1063/1.1662089