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Metal–Oxide RRAM.

Authors :
Wong, H.-S. Philip
Lee, Heng-Yuan
Yu, Shimeng
Chen, Yu-Sheng
Wu, Yi
Chen, Pang-Shiu
Lee, Byoungil
Chen, Frederick T.
Tsai, Ming-Jinn
Source :
Proceedings of the IEEE; Jun2012, Vol. 100 Issue 6, p1951-1970, 20p
Publication Year :
2012

Abstract

In this paper, recent progress of binary metal–oxide resistive switching random access memory (RRAM) is reviewed. The physical mechanism, material properties, and electrical characteristics of a variety of binary metal–oxide RRAM are discussed, with a focus on the use of RRAM for nonvolatile memory application. A review of recent development of large-scale RRAM arrays is given. Issues such as uniformity, endurance, retention, multibit operation, and scaling trends are discussed. [ABSTRACT FROM PUBLISHER]

Details

Language :
English
ISSN :
00189219
Volume :
100
Issue :
6
Database :
Complementary Index
Journal :
Proceedings of the IEEE
Publication Type :
Academic Journal
Accession number :
75233662
Full Text :
https://doi.org/10.1109/JPROC.2012.2190369