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Transition between Ge segregation and trapping during high-pressure oxidation of GexSi1-x/Si.
- Source :
- Journal of Applied Physics; 10/1/1993, Vol. 74 Issue 7, p4750, 6p, 2 Diagrams, 1 Chart, 3 Graphs
- Publication Year :
- 1993
-
Abstract
- Reports on the transition between germanium segregation and trapping during high-pressure oxidation of Ge[subx]Si[sub1-x]/Si. Analysis of the atomic fraction x of germanium; Effect of oxidation on the germanium distribution; Significance of the oxidation of Ge[subx]Si[sub1-x] alloys.
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 74
- Issue :
- 7
- Database :
- Complementary Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7621338
- Full Text :
- https://doi.org/10.1063/1.354345