Simultaneous Sb doping and formation of self-aligned TiSi2 by codeposition of Ti and Sb.

Authors :: Li, X.-H.
Gong, S. F.
Hentzell, H. T. G.
Hagel, J.
Robertsson, A.
Source :: Journal of Applied Physics; 4/1/1991, Vol. 69 Issue 7, p3924, 5p, 6 Graphs
Publication Year :: 1991
Abstract: Deals with a study which examined the simultaneous antimony doping and formation of self-aligned titanium silicide. Analysis of the structure of the films after annealing; Microstructures of titanium silicides and antimony behavior during silicide formation; Formation of shallow junctions in silicon substrate.

Subjects :: ANTIMONY
SEMICONDUCTOR doping
TITANIUM compounds
ANNEALING of metals

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