Quick ellipsometric technique for determining the thicknesses and optical constant profiles of Fe/SiO/Si(100) nanostructures during growth.

Authors :: Tarasov, I.
Kosyrev, N.
Varnakov, S.
Ovchinnikov, S.
Zharkov, S.
Shvets, V.
Bondarenko, S.
Tereshchenko, O.
Source :: Technical Physics; Sep2012, Vol. 57 Issue 9, p1225-1229, 5p, 1 Black and White Photograph, 1 Chart, 3 Graphs
Publication Year :: 2012
Abstract: An algorithm is developed to perform rapid control of the thickness and optical constants of a film structure during growth. This algorithm is tested on Fe/SiO/Si(100) structures grown in an Angara molecular-beam epitaxy setup. The film thicknesses determined during their growth are compared with X-ray spectral fluorescence analysis and transmission electron microscopy data. [ABSTRACT FROM AUTHOR]

Subjects :: ELLIPSOMETRY
OPTICAL constants
IRON
NANOSTRUCTURES
ALGORITHMS
THIN films
MOLECULAR beam epitaxy

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