Etching of poly-Si with atomic scale accuracy in inductively coupled Ar and He plasmas.

Details

Language :

English

ISBNs :

9781424401604

Database :

Complementary Index

Journal :

2006 8th International Conference on Solid-State & Integrated Circuit Technology Proceedings

Publication Type :

Conference

Accession number :

80811587

Full Text :

https://doi.org/10.1109/ICSICT.2006.306312