Control of Source and Drain Extension Phosphorus Profile by Using Carbon Co-Implant.

Details

Language :

English

ISBNs :

9781424412280

Database :

Complementary Index

Journal :

2007 15th International Conference on Advanced Thermal Processing of Semiconductors

Publication Type :

Conference

Accession number :

80861545

Full Text :

https://doi.org/10.1109/RTP.2007.4383831