Reduction of particle generation in capacitively coupled plasma etching reactor.

Details

Language :

English

ISBNs :

9781424411429

Database :

Complementary Index

Journal :

2007 International Symposium on Semiconductor Manufacturing

Publication Type :

Conference

Accession number :

80942235

Full Text :

https://doi.org/10.1109/ISSM.2007.4446859