The difference of chemical binding states between ultra shallow plasma doping (PD) and ion implantation (I/I) samples studied by hard X-ray photoelectron spectroscopy (HX-PES).

Details

Language :

English

ISBNs :

9781424411030

Database :

Complementary Index

Journal :

2007 International Workshop on Junction Technology

Publication Type :

Conference

Accession number :

80943161

Full Text :

https://doi.org/10.1109/IWJT.2007.4279944