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ArF lithography for the 130 and 100 nm technology nodes.

Authors :
Ronse, K.
Source :
2000 International Microprocesses & Nanotechnology Conference Digest of Papers Microprocesses & Nanotechnology 2000 (IEEE Cat. No.00EX387); 2000, p6-7, 2p
Publication Year :
2000

Details

Language :
English
ISBNs :
9784891140045
Database :
Complementary Index
Journal :
2000 International Microprocesses & Nanotechnology Conference Digest of Papers Microprocesses & Nanotechnology 2000 (IEEE Cat. No.00EX387)
Publication Type :
Conference
Accession number :
81127964
Full Text :
https://doi.org/10.1109/IMNC.2000.872597