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UV-based nanoimprint lithography for photosensitive dry film.

Authors :
Nakamatsu, K.
Tone, K.
Matsui, S.
Source :
2005 Digest of Papers Microprocesses & Nanotechnology; 2005, p202-203, 2p
Publication Year :
2005

Details

Language :
English
ISBNs :
9784990247225
Database :
Complementary Index
Journal :
2005 Digest of Papers Microprocesses & Nanotechnology
Publication Type :
Conference
Accession number :
81128392
Full Text :
https://doi.org/10.1109/IMNC.2005.203808