Cluster Ion Implantation for beyond 45nm node novel device applications.

Authors :: Tanjyo, M.
Nagayama, T.
Hamamoto, N.
Umisedo, S.
Koga, Y.
Maehara, N.
Matsumoto, T.
Nagai, N.
Ootsuka, F.
Katakami, A.
Shirai, K.
Watanabe, T.
Nakata, H.
Kitajima, M.
Aoyama, T.
Eimori, T.
Nara, Y.
Ohji, Y.
Saker, K.
Krull, W.
Source :: Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08); 2008, p55-57, 3p
Publication Year :: 2008

Language :: English
ISBNs :: 9781424417377
Database :: Complementary Index
Journal :: Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08)
Publication Type :: Conference
Accession number :: 81134864
Full Text :: https://doi.org/10.1109/IWJT.2008.4540017