Profiling of carrier properties for shallow junctions using a new sub-nanometer step-by-step etching technique.

Details

Language :

English

ISBNs :

9781424417377

Database :

Complementary Index

Journal :

Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08)

Publication Type :

Conference

Accession number :

81134865

Full Text :

https://doi.org/10.1109/IWJT.2008.4540018