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Local electrical properties of HfO2 thin films measured by conducting atomic force microscopy.
- Source :
- Extended Abstracts of International Workshop on Gate Insulator. IWGI 2001 (IEEE Cat. No.01EX537); 2001, p180-183, 4p
- Publication Year :
- 2001
Details
- Language :
- English
- ISBNs :
- 9784891140212
- Database :
- Complementary Index
- Journal :
- Extended Abstracts of International Workshop on Gate Insulator. IWGI 2001 (IEEE Cat. No.01EX537)
- Publication Type :
- Conference
- Accession number :
- 81134979
- Full Text :
- https://doi.org/10.1109/IWGI.2001.967578