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In-situ measurements of internal stresses in copper thin films during thermal cycling using synchrotron X-rays.
- Source :
- Micro-Nanomechatronics & Human Science, 2004 & the Fourth Symposium Micro-Nanomechatronics for Information-Based Society, 2004; 2004, p69-73, 5p
- Publication Year :
- 2004
Details
- Language :
- English
- ISBNs :
- 9780780386075
- Database :
- Complementary Index
- Journal :
- Micro-Nanomechatronics & Human Science, 2004 & the Fourth Symposium Micro-Nanomechatronics for Information-Based Society, 2004
- Publication Type :
- Conference
- Accession number :
- 81190498
- Full Text :
- https://doi.org/10.1109/MHS.2004.1421279