Control of Contact Hole Distortion by Using Polymer Deposition Process (PDP) for sub-65nm Technology and Beyond.

MLA

Judy Wang, et al. “Control of Contact Hole Distortion by Using Polymer Deposition Process (PDP) for Sub-65nm Technology and Beyond.” 17th Annual SEMI/IEEE ASMC 2006 Conference, Jan. 2006, pp. 83–87. EBSCOhost, https://doi.org/10.1109/ASMC.2006.1638728.

APA

Judy Wang, Shing-li Sung, & Shawming Ma. (2006). Control of Contact Hole Distortion by Using Polymer Deposition Process (PDP) for sub-65nm Technology and Beyond. 17th Annual SEMI/IEEE ASMC 2006 Conference, 83–87. https://doi.org/10.1109/ASMC.2006.1638728

Chicago

Judy Wang, Shing-li Sung, and Shawming Ma. 2006. “Control of Contact Hole Distortion by Using Polymer Deposition Process (PDP) for Sub-65nm Technology and Beyond.” 17th Annual SEMI/IEEE ASMC 2006 Conference, January, 83–87. doi:10.1109/ASMC.2006.1638728.