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Deffect profiling in the SiO2/ Al2O3 interface using Variable Tcharge-Tdischarge Amplitude Charge Pumping (VT2ACP).

Authors :
Zahid, M.B.
Degraeve, R.
Cho, M.
Pantisano, L.
Aguado, D.R.
Van Houdt, J.
Groeseneken, G.
Jurczak, M.
Source :
2009 IEEE International Reliability Physics Symposium; 2009, p21-25, 5p
Publication Year :
2009

Details

Language :
English
ISBNs :
9781424428885
Database :
Complementary Index
Journal :
2009 IEEE International Reliability Physics Symposium
Publication Type :
Conference
Accession number :
81322575
Full Text :
https://doi.org/10.1109/IRPS.2009.5173219