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Mobility reduction and reliability assessment of high-k/metal gate stacks in deep sub-nanometer EOT region.

Authors :
Dawei Heh
Bersuker, G.
Huang, J.
Kirsch, P.D.
Hsing-Huang Tseng
Jammy, R.
Source :
2009 Proceedings of the European Solid State Device Research Conference; 2009, p257-260, 4p
Publication Year :
2009

Details

Language :
English
ISBNs :
9781424443512
Database :
Complementary Index
Journal :
2009 Proceedings of the European Solid State Device Research Conference
Publication Type :
Conference
Accession number :
81544134
Full Text :
https://doi.org/10.1109/ESSDERC.2009.5331522