Tracking control of an electrostatic torsional micromirror beyond the pull-in limit with enhanced performance.

MLA

Sun, Weijie, et al. “Tracking Control of an Electrostatic Torsional Micromirror beyond the Pull-in Limit with Enhanced Performance.” 2012 International Conference on Manipulation, Manufacturing & Measurement on the Nanoscale (3M-NANO), Jan. 2012, pp. 216–21. EBSCOhost, https://doi.org/10.1109/3M-NANO.2012.6472958.

APA

Sun, W., Yeow, J. T. W., & Sun, Z. (2012). Tracking control of an electrostatic torsional micromirror beyond the pull-in limit with enhanced performance. 2012 International Conference on Manipulation, Manufacturing & Measurement on the Nanoscale (3M-NANO), 216–221. https://doi.org/10.1109/3M-NANO.2012.6472958

Chicago

Sun, Weijie, John T. W. Yeow, and Zhendong Sun. 2012. “Tracking Control of an Electrostatic Torsional Micromirror beyond the Pull-in Limit with Enhanced Performance.” 2012 International Conference on Manipulation, Manufacturing & Measurement on the Nanoscale (3M-NANO), January, 216–21. doi:10.1109/3M-NANO.2012.6472958.