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Hopping conduction distance dependent activation energy characteristics of Zn:SiO2 resistance random access memory devices.

Authors :
Chen, Kai-Huang
Zhang, Rui
Chang, Ting-Chang
Tsai, Tsung-Ming
Chang, Kuan-Chang
Lou, J. C.
Young, Tai-Fa
Chen, Jung-Hui
Shih, Chih-Cheng
Tung, Cheng-Wei
Syu, Yong-En
Sze, Simon M.
Source :
Applied Physics Letters; 4/1/2013, Vol. 102 Issue 13, p133503-133503-3, 1p, 1 Diagram, 3 Graphs
Publication Year :
2013

Abstract

In this study, the hopping conduction distance variation of Zn:SiO2 resistance random access memory (RRAM) devices with different operating compliance currents was discussed and verified. To investigate and determine the hopping conduction distance dependent activation energy characteristics, the Arrhenius plot of low resistance state of Zn:SiO2 RRAM devices was applied, from which we proposed carrier conduction model. With the increase of current compliance, more metal ions would accumulate to form precipitates with larger diameter, which in turn resulted in the shortening of hopping distance. Because of shorter hopping distance, activation energy for carrier hopping would decrease. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00036951
Volume :
102
Issue :
13
Database :
Complementary Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
86726265
Full Text :
https://doi.org/10.1063/1.4799655