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A TEM Study of the Structure of Polycrystalline Si Films on (111) Si Substrates Grown by Low Pressure Chemical Vapor Deposition.

Authors :
Piette, Scott A.
Kiely, Chris J.
Eden, J. Gary
Source :
MRS Online Proceedings Library; 01/07/1988, Vol. 106, pN.PAG-1, 1p
Publication Year :
1988

Details

Language :
English
ISSN :
19464274
Volume :
106
Database :
Complementary Index
Journal :
MRS Online Proceedings Library
Publication Type :
Conference
Accession number :
86836056
Full Text :
https://doi.org/10.1557/PROC-106-15