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High-Temperature Operation of Diamond Junction Field-Effect Transistors With Lateral p-n Junctions.

Authors :
Iwasaki, Takayuki
Hoshino, Yuto
Tsuzuki, Kohei
Kato, Hiromitsu
Makino, Toshiharu
Ogura, Masahiko
Takeuchi, Daisuke
Okushi, Hideyo
Yamasaki, Satoshi
Hatano, Mutsuko
Source :
IEEE Electron Device Letters; Sep2013, Vol. 34 Issue 9, p1175-1177, 3p
Publication Year :
2013

Abstract

High-temperature performance of diamond junction field-effect transistors (JFETs) with lateral p-n junctions is demonstrated. Diamond JFETs fabricated by n-type selective growth can be operated at 723 K, and show very low leakage currents of \sim10^-13~A and high ON/OFF ratios >10^6. Specific on-resistance decreases from 52.2 m\Omega\cdotcm^2 at 300 K to 1.4 m\Omega\cdotcm^2 at 723 K. At high temperatures, the device shows steep subthreshold swings very close to the theoretical limit. The low leakage currents are maintained even at a high drain voltage of -100~V. These excellent properties at high temperatures and high voltage show that diamond JFETs can work in harsh environments. [ABSTRACT FROM PUBLISHER]

Details

Language :
English
ISSN :
07413106
Volume :
34
Issue :
9
Database :
Complementary Index
Journal :
IEEE Electron Device Letters
Publication Type :
Academic Journal
Accession number :
89927427
Full Text :
https://doi.org/10.1109/LED.2013.2271377