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High-Temperature Operation of Diamond Junction Field-Effect Transistors With Lateral p-n Junctions.
- Source :
- IEEE Electron Device Letters; Sep2013, Vol. 34 Issue 9, p1175-1177, 3p
- Publication Year :
- 2013
-
Abstract
- High-temperature performance of diamond junction field-effect transistors (JFETs) with lateral p-n junctions is demonstrated. Diamond JFETs fabricated by n-type selective growth can be operated at 723 K, and show very low leakage currents of \sim10^-13~A and high ON/OFF ratios >10^6. Specific on-resistance decreases from 52.2 m\Omega\cdotcm^2 at 300 K to 1.4 m\Omega\cdotcm^2 at 723 K. At high temperatures, the device shows steep subthreshold swings very close to the theoretical limit. The low leakage currents are maintained even at a high drain voltage of -100~V. These excellent properties at high temperatures and high voltage show that diamond JFETs can work in harsh environments. [ABSTRACT FROM PUBLISHER]
Details
- Language :
- English
- ISSN :
- 07413106
- Volume :
- 34
- Issue :
- 9
- Database :
- Complementary Index
- Journal :
- IEEE Electron Device Letters
- Publication Type :
- Academic Journal
- Accession number :
- 89927427
- Full Text :
- https://doi.org/10.1109/LED.2013.2271377