Formation of crystalline ?-Al2O3 induced by variable substrate biasing during reactive magnetron sputtering.

MLA

Prenzel, M., et al. “Formation of Crystalline ?-Al2O3 Induced by Variable Substrate Biasing during Reactive Magnetron Sputtering.” Journal of Physics D: Applied Physics, vol. 46, no. 8, Feb. 2013, pp. 1–9. EBSCOhost, https://doi.org/10.1088/0022-3727/46/8/084004.

APA

Prenzel, M., Kortmann, A., von Keudell, A., Nahif, F., Schneider, J. M., Shihab, M., & Brinkmann, R. P. (2013). Formation of crystalline ?-Al2O3 induced by variable substrate biasing during reactive magnetron sputtering. Journal of Physics D: Applied Physics, 46(8), 1–9. https://doi.org/10.1088/0022-3727/46/8/084004

Chicago

Prenzel, M., A. Kortmann, A. von Keudell, F. Nahif, J. M. Schneider, M. Shihab, and R. P. Brinkmann. 2013. “Formation of Crystalline ?-Al2O3 Induced by Variable Substrate Biasing during Reactive Magnetron Sputtering.” Journal of Physics D: Applied Physics 46 (8): 1–9. doi:10.1088/0022-3727/46/8/084004.