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Lithography for 0.25 mu m and below using simple high-performance optics.

Authors :
Pease, R.F.W.
Owen, G.
Hsieh, R.L.
Grenville, A.
von Bunau, R.
Maluf, N.I.
Source :
1992 Symposium on VLSI Technology Digest of Technical Papers; 1992, p116-117, 2p
Publication Year :
1992

Details

Language :
English
ISBNs :
9780780306981
Database :
Complementary Index
Journal :
1992 Symposium on VLSI Technology Digest of Technical Papers
Publication Type :
Conference
Accession number :
92091852
Full Text :
https://doi.org/10.1109/VLSIT.1992.200676