Optical lithography techniques for 0.25 /spl mu/m and below: CD control issues.

Authors :: van den Hove, L.
Ronse, K.
Pforr, R.
Source :: 1995 International Symposium on VLSI Technology, Systems & Applications Proceedings of Technical Papers; 1995, p24-30, 7p
Publication Year :: 1995

Language :: English
ISBNs :: 9780780327733
Database :: Complementary Index
Journal :: 1995 International Symposium on VLSI Technology, Systems & Applications Proceedings of Technical Papers
Publication Type :: Conference
Accession number :: 92107568
Full Text :: https://doi.org/10.1109/VTSA.1995.524627