Diluted wet oxidation: a novel technique for ultra thin gate oxide formation.

Authors :: Tanabe, Y.
Nakatsuka, Y.
Sakai, S.
Miyazaki, T.
Nagahama, T.
Source :: 1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No97CH36023); 1997, pP49-P52, 4p
Publication Year :: 1997

Language :: English
ISBNs :: 9780780337527
Database :: Complementary Index
Journal :: 1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No97CH36023)
Publication Type :: Conference
Accession number :: 92119802
Full Text :: https://doi.org/10.1109/ISSM.1997.664621