Effective in-line defect monitoring with variable wafer area coverage.

Authors :: Kuo, W.W.
Akella, R.
Fletcher, D.
Source :: 1997 IEEE/SEMI Advanced Semiconductor Manufacturing Conference & Workshop ASMC 97 Proceedings; 1997, p289-293, 5p
Publication Year :: 1997

Language :: English
ISBNs :: 9780780340503
Database :: Complementary Index
Journal :: 1997 IEEE/SEMI Advanced Semiconductor Manufacturing Conference & Workshop ASMC 97 Proceedings
Publication Type :: Conference
Accession number :: 92121665
Full Text :: https://doi.org/10.1109/ASMC.1997.630750