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Investigation of KOH anisotropic etching of Si <100> wafers for improving etched surface quality.

Authors :
Wang Wei
Liu Xiaowei
Wang Xilian
Liu Yuqiang
Fan Maojun
Source :
1998 5th International Conference on Solid-State & Integrated Circuit Technology Proceedings (Cat No98EX105); 1998, p127-130, 4p
Publication Year :
1998

Details

Language :
English
ISBNs :
9780780343061
Database :
Complementary Index
Journal :
1998 5th International Conference on Solid-State & Integrated Circuit Technology Proceedings (Cat No98EX105)
Publication Type :
Conference
Accession number :
92123417
Full Text :
https://doi.org/10.1109/ICSICT.1998.785819