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Nitride cladded poly-Si spacer LOCOS (NCPSL) isolation technology for the 1 giga bit DRAM.

Authors :
Kim, S.E.
Kim, Y.D.
Ahn, D.H.
Hong, S.J.
Shin, Y.G.
Park, Y.W.
Kang, H.K.
Koh, Y.B.
Lee, M.Y.
Source :
International Electron Devices Meeting Technical Digest; 1996, p825-828, 4p
Publication Year :
1996

Details

Language :
English
ISBNs :
9780780333932
Database :
Complementary Index
Journal :
International Electron Devices Meeting Technical Digest
Publication Type :
Conference
Accession number :
92188475
Full Text :
https://doi.org/10.1109/IEDM.1996.554106