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Hydrogen denudation for enhanced thin oxide quality, device performance, and potential epitaxial elimination.

Authors :
Gardner, M.
Wristers, D.
Fulford, J.
Borland, J.
Source :
Proceedings of 1994 VLSI Technology Symposium; 1994, p111-112, 2p
Publication Year :
1994

Details

Language :
English
ISBNs :
9780780319219
Database :
Complementary Index
Journal :
Proceedings of 1994 VLSI Technology Symposium
Publication Type :
Conference
Accession number :
92271691
Full Text :
https://doi.org/10.1109/VLSIT.1994.324430