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Identification of MOS oxide defect location with a spatial resolution less than 0.1 /spl mu/m using photoemission microscope.
- Source :
- ICMTS 1999 Proceedings of 1999 International Conference on Microelectronic Test Structures (Cat No99CH36307); 1999, p89-94, 6p
- Publication Year :
- 1999
Details
- Language :
- English
- ISBNs :
- 9780780352704
- Database :
- Complementary Index
- Journal :
- ICMTS 1999 Proceedings of 1999 International Conference on Microelectronic Test Structures (Cat No99CH36307)
- Publication Type :
- Conference
- Accession number :
- 92473791
- Full Text :
- https://doi.org/10.1109/ICMTS.1999.766222