Comparison of integrated in situ RIE preclean processes for CVD tungsten silicide deposition done in a cluster tool.

Details

Language :

English

Database :

Complementary Index

Journal :

IEEE/SEMI International Symposium on Semiconductor Manufacturing Science

Publication Type :

Conference

Accession number :

92483404

Full Text :

https://doi.org/10.1109/ISMSS.1990.66115