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0.12-μm gate III-V nitride HFET's with high contact resistances.

Authors :
Burm, J.
Chu, K.
Schaff, W.J.
Eastman, L.F.
Khan, M.A.
Qisheng Chen
Yang, J.W.
Shur, M.S.
Source :
IEEE Electron Device Letters; 1997, Vol. 18 Issue 4, p141-143, 3p
Publication Year :
1997

Details

Language :
English
ISSN :
07413106
Volume :
18
Issue :
4
Database :
Complementary Index
Journal :
IEEE Electron Device Letters
Publication Type :
Academic Journal
Accession number :
92796580
Full Text :
https://doi.org/10.1109/55.563309