Back to Search Start Over

Analysis on the CTLM and LTLM applicability for GaN HEMTs structure alloyed ohmic contact resistance evaluation.

Authors :
Shuxun Lin
Di Meng
Wen, Cheng P.
Maojun Wang
Jinyan Wang
Yilong Hao
Yaohui Zhang
Kei May Lau
Source :
2013 IEEE International Conference of Electron Devices & Solid-state Circuits; 2013, p1-2, 2p
Publication Year :
2013

Details

Language :
English
ISBNs :
9781467325233
Database :
Complementary Index
Journal :
2013 IEEE International Conference of Electron Devices & Solid-state Circuits
Publication Type :
Conference
Accession number :
92928162
Full Text :
https://doi.org/10.1109/EDSSC.2013.6628128