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Highly reliable high-voltage transistors by use of the SIPOS process.

Authors :
Matsushita, T.
Aoki, T.
Ohtsu, T.
Yamoto, H.
Hayashi, H.
Okayama, M.
Kawana, Y.
Source :
IEEE Transactions on Electron Devices; 1976, Vol. 23 Issue 8, p826-830, 5p
Publication Year :
1976

Details

Language :
English
ISSN :
00189383
Volume :
23
Issue :
8
Database :
Complementary Index
Journal :
IEEE Transactions on Electron Devices
Publication Type :
Academic Journal
Accession number :
93111664
Full Text :
https://doi.org/10.1109/T-ED.1976.18494