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Mode transition in CF4 + Ar inductively coupled plasma.

Authors :
Liu, Wei
Gao, Fei
Zhao, Shu-Xia
Li, Xue-Chun
Wang, You-Nian
Source :
Physics of Plasmas; Dec2013, Vol. 20 Issue 12, p123513, 8p, 1 Diagram, 10 Graphs
Publication Year :
2013

Abstract

The E to H mode transitions are studied by a hairpin probe and optical emission spectroscopy in inductively coupled CF4 + Ar plasmas. Electron density, optical emission intensity of Ar, and the voltage and current are measured during the E to H mode transitions. It is found that the electron density and plasma emission intensity increase continuously at low pressure during the E to H mode transition, while they jump up discontinuously at high pressure. Meanwhile, the transition threshold power and ▵P (the power interval between E and H mode) increase by increasing the pressure. When the ratio of CF4 increases, the E to H mode transition happens at higher applied power, and meanwhile, the ▵P also significantly increases. Besides, the effects of CF4 gas ratio on the plasma properties and the circuit electrical properties in both pure E and H modes were also investigated. The electron density and plasma emission intensity both decrease upon increasing the ratio of CF4 at the two modes, due to the stronger electrons loss scheme. The applied voltages at E and H modes both increase as increasing the CF4 gas ratio, however the applied current at two modes behave just oppositely with the gas ratio. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
1070664X
Volume :
20
Issue :
12
Database :
Complementary Index
Journal :
Physics of Plasmas
Publication Type :
Academic Journal
Accession number :
93390974
Full Text :
https://doi.org/10.1063/1.4858900