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600 V Diamond Junction Field-Effect Transistors Operated at 200^\circC.

Authors :
Iwasaki, Takayuki
Yaita, Junya
Kato, Hiromitsu
Makino, Toshiharu
Ogura, Masahiko
Takeuchi, Daisuke
Okushi, Hideyo
Yamasaki, Satoshi
Hatano, Mutsuko
Source :
IEEE Electron Device Letters; Feb2014, Vol. 35 Issue 2, p241-243, 3p
Publication Year :
2014

Abstract

Blocking characteristics of diamond junction field-effect transistors were evaluated at room temperature (RT) and 200^\circC. A high source-drain bias (breakdown voltage) of 566 V was recorded at RT, whereas it increased to 608 V at 200^\circC. The positive temperature coefficient of the breakdown voltage indicates the avalanche breakdown of the device. We found that the breakdown occurred at the drain edge of the p-n junction between p-channel and the n^+-gates. All four devices measured in this letter showed a maximum gate-drain bias over 500 V at RT and 600 V at 200^\circC. [ABSTRACT FROM PUBLISHER]

Details

Language :
English
ISSN :
07413106
Volume :
35
Issue :
2
Database :
Complementary Index
Journal :
IEEE Electron Device Letters
Publication Type :
Academic Journal
Accession number :
94082308
Full Text :
https://doi.org/10.1109/LED.2013.2294969