Back to Search
Start Over
600 V Diamond Junction Field-Effect Transistors Operated at 200^\circC.
- Source :
- IEEE Electron Device Letters; Feb2014, Vol. 35 Issue 2, p241-243, 3p
- Publication Year :
- 2014
-
Abstract
- Blocking characteristics of diamond junction field-effect transistors were evaluated at room temperature (RT) and 200^\circC. A high source-drain bias (breakdown voltage) of 566 V was recorded at RT, whereas it increased to 608 V at 200^\circC. The positive temperature coefficient of the breakdown voltage indicates the avalanche breakdown of the device. We found that the breakdown occurred at the drain edge of the p-n junction between p-channel and the n^+-gates. All four devices measured in this letter showed a maximum gate-drain bias over 500 V at RT and 600 V at 200^\circC. [ABSTRACT FROM PUBLISHER]
Details
- Language :
- English
- ISSN :
- 07413106
- Volume :
- 35
- Issue :
- 2
- Database :
- Complementary Index
- Journal :
- IEEE Electron Device Letters
- Publication Type :
- Academic Journal
- Accession number :
- 94082308
- Full Text :
- https://doi.org/10.1109/LED.2013.2294969