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A static capacitance probe structure for resolving the sidewall skew angle of Silicon Deep Reactive-Ion Etching.

Authors :
Jia, Kemiao
Geisberger, Aaron
Dickens, Andrew
Steimle, Robert
Chang, David C.
Winebarger, Paul
Liu, Lianjun
McNeil, Andrew
Source :
2014 IEEE 27th International Conference on Micro Electro Mechanical Systems (MEMS); 2014, p36-39, 4p
Publication Year :
2014

Details

Language :
English
ISBNs :
9781479935093
Database :
Complementary Index
Journal :
2014 IEEE 27th International Conference on Micro Electro Mechanical Systems (MEMS)
Publication Type :
Conference
Accession number :
95486069
Full Text :
https://doi.org/10.1109/MEMSYS.2014.6765567