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A static capacitance probe structure for resolving the sidewall skew angle of Silicon Deep Reactive-Ion Etching.
- Source :
- 2014 IEEE 27th International Conference on Micro Electro Mechanical Systems (MEMS); 2014, p36-39, 4p
- Publication Year :
- 2014
Details
- Language :
- English
- ISBNs :
- 9781479935093
- Database :
- Complementary Index
- Journal :
- 2014 IEEE 27th International Conference on Micro Electro Mechanical Systems (MEMS)
- Publication Type :
- Conference
- Accession number :
- 95486069
- Full Text :
- https://doi.org/10.1109/MEMSYS.2014.6765567