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Dual Ion Effect of the Lithium Silicate Resistance Random Access Memory.

Authors :
Chang, Kuan-Chang
Tsai, Tsung-Ming
Chang, Ting-Chang
Chen, Kai-Huang
Zhang, Rui
Wang, Zhi-Yang
Chen, Jung-Hui
Young, Tai-Fa
Chen, Min-Chen
Chu, Tian-Jian
Huang, Syuan-Yong
Syu, Yong-En
Bao, Ding-Hua
Sze, Simon M.
Source :
IEEE Electron Device Letters; May2014, Vol. 35 Issue 5, p530-532, 3p
Publication Year :
2014

Abstract

In this letter, dual ion effect induced reset process of lithium silicate resistance random access memory (RRAM) devices is studied and discussed. Unlike the traditional silicon oxide-based RRAM, lithium ions also participate in the resistive switching process except for the oxygen ions. Owing to the twofold chemical reaction, the high resistance states are randomly distributed in a wide range. Schottky emission can be obtained through conduction current fitting, and a reaction model is established to demonstrate the special behaviors of the two types of ions, which also clarifies the gradual change of current fitting results. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
07413106
Volume :
35
Issue :
5
Database :
Complementary Index
Journal :
IEEE Electron Device Letters
Publication Type :
Academic Journal
Accession number :
95720796
Full Text :
https://doi.org/10.1109/LED.2014.2311295