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Local magnetoresistance through Si and its bias voltage dependence in ferromagnet/MgO/silicon-on-insulator lateral spin valves.

Authors :
Saito, Y.
Tanamoto, T.
Ishikawa, M.
Sugiyama, H.
Inokuchi, T.
Hamaya, K.
Tezuka, N.
Source :
Journal of Applied Physics; 2014, Vol. 115 Issue 17, p17C514-1-17C514-3, 3p
Publication Year :
2014

Abstract

Local magnetoresistance (MR) through silicon (Si) and its bias voltage (V<subscript>bias</subscript>) (bias current (I<subscript>bias</subscript>)) dependence in ferromagnet (FM)/MgO/silicon-on-insulator lateral spin valves are investigated. From the experimental measurements, we find that the local-MR through Si increases with increasing V<subscript>bias</subscript>. This anomalous increase of local-MR as a function of V<subscript>bias</subscript> can be understood by considering the standard drift-diffusion theory improved by taking into account the difference in the interface resistances and first order quantum effect between FM/MgO/Si (source) and Si/MgO/FM (drain) interfaces. The interface resistance dependence on experimentally obtained local-MR ratios also agrees with the improved standard spin diffusion theory. These results indicate that experimentally observed local-MR is certainly related to the spin signal through the Si bulk band. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00218979
Volume :
115
Issue :
17
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
95982662
Full Text :
https://doi.org/10.1063/1.4866699