Crystalline carbon nitride thin films deposited by microwave plasma chemical vapor deposition.

MLA

Yong-ping, Zhang, et al. “Crystalline Carbon Nitride Thin Films Deposited by Microwave Plasma Chemical Vapor Deposition.” Chinese Physics, vol. 9, no. 7, July 2000, p. 1. EBSCOhost, https://doi.org/10.1088/1009-1963/9/7/015.

APA

Yong-ping, Z., You-song, G., Xiang-rong, C., Zhong-zhuo, T., Dong-xia, S., Xiu-fang, Z., & Lei, Y. (2000). Crystalline carbon nitride thin films deposited by microwave plasma chemical vapor deposition. Chinese Physics, 9(7), 1. https://doi.org/10.1088/1009-1963/9/7/015

Chicago

Yong-ping, Zhang, Gu You-song, Chang Xiang-rong, Tian Zhong-zhuo, Shi Dong-xia, Zhang Xiu-fang, and Yuan Lei. 2000. “Crystalline Carbon Nitride Thin Films Deposited by Microwave Plasma Chemical Vapor Deposition.” Chinese Physics 9 (7): 1. doi:10.1088/1009-1963/9/7/015.