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ALD ZrO2 processes for BEoL device applications.

Authors :
Weinreich, Wenke
Seidel, Konrad
Polakowski, Patrick
Riedel, Stefan
Wilde, Lutz
Triyoso, Dina H.
Nolan, Mark G.
Source :
2014 IEEE International Conference on IC Design & Technology; 2014, p1-4, 4p
Publication Year :
2014

Details

Language :
English
ISBNs :
9781479921539
Database :
Complementary Index
Journal :
2014 IEEE International Conference on IC Design & Technology
Publication Type :
Conference
Accession number :
98450547
Full Text :
https://doi.org/10.1109/ICICDT.2014.6838604