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In Situ Real-Time Monitoring of ITO Film under a Chemical Etching Process Using Fourier Transform Electrochemical Impedance Spectroscopy.

Authors :
Han, Seok Hee
Rho, Jihun
Lee, Sunmi
Kim, Moonjoo
Kim, Sung Il
Park, Sangmee
Jang, Woohyuk
Lee, Chang Heon
Chang, Byoung-Yong
Chung, Taek Dong
Source :
Analytical Chemistry; 8/4/2020, Vol. 92 Issue 15, p10504-10511, 8p
Publication Year :
2020

Details

Language :
English
ISSN :
00032700
Volume :
92
Issue :
15
Database :
Supplemental Index
Journal :
Analytical Chemistry
Publication Type :
Academic Journal
Accession number :
144965544
Full Text :
https://doi.org/10.1021/acs.analchem.0c01294