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Low-Temperature Growth of Ferroelectric Hf0.5Zr0.5O2 Thin Films Assisted by Deep Ultraviolet Light Irradiation.
- Source :
- ACS Applied Electronic Materials; 3/23/2021, Vol. 3 Issue 3, p1244-1251, 8p
- Publication Year :
- 2021
Details
- Language :
- English
- ISSN :
- 26376113
- Volume :
- 3
- Issue :
- 3
- Database :
- Supplemental Index
- Journal :
- ACS Applied Electronic Materials
- Publication Type :
- Academic Journal
- Accession number :
- 149468676
- Full Text :
- https://doi.org/10.1021/acsaelm.0c01065