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Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric ResistUtilizing Radical- and Acid-Amplified Cross-Linking.

Authors :
Naqvi, Bilal A.
Enomoto, Satoshi
Machida, Kohei
Takata, Yui
Kozawa, Takahiro
Muroya, Yusa
De Gendt, Stefan
De Simone, Danilo
Source :
Chemistry of Materials; 2/13/2024, Vol. 36 Issue 3, p1459-1471, 13p
Publication Year :
2024

Details

Language :
English
ISSN :
08974756
Volume :
36
Issue :
3
Database :
Supplemental Index
Journal :
Chemistry of Materials
Publication Type :
Academic Journal
Accession number :
175449672
Full Text :
https://doi.org/10.1021/acs.chemmater.3c02628