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Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric ResistUtilizing Radical- and Acid-Amplified Cross-Linking.
- Source :
- Chemistry of Materials; 2/13/2024, Vol. 36 Issue 3, p1459-1471, 13p
- Publication Year :
- 2024
Details
- Language :
- English
- ISSN :
- 08974756
- Volume :
- 36
- Issue :
- 3
- Database :
- Supplemental Index
- Journal :
- Chemistry of Materials
- Publication Type :
- Academic Journal
- Accession number :
- 175449672
- Full Text :
- https://doi.org/10.1021/acs.chemmater.3c02628