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Low temperature crystallization of SrBi2Ta2O9 (SBT) films

Authors :
Uchiyama, K.
Arita, K.
Shimada, Y.
Hayashi, S.
Fujii, E.
Otsuki, T.
Solayappan, N.
Joshi, V.
DE Araujo, C. A. Paz
Source :
Integrated Ferroelectrics; October 2000, Vol. 30 Issue: 1 p103-110, 8p
Publication Year :
2000

Abstract

650°C process of SrBi2Ta2O9 (SBT) has been achieved through the use of new metal organic deposition (MOD) solution and the optimization of the deposition conditions. The sample showed a high remnant polarization (2Pr) of 14 μC/cm2 @3V, a low leakage current of 10-8 A/cm2 or less @3V, and a fatigue-free nature. We believe this processing will realize high-density FeRAM integration of SBT.

Details

Language :
English
ISSN :
10584587 and 16078489
Volume :
30
Issue :
1
Database :
Supplemental Index
Journal :
Integrated Ferroelectrics
Publication Type :
Periodical
Accession number :
ejs11322579
Full Text :
https://doi.org/10.1080/10584580008222258